| 摘要 |
PROBLEM TO BE SOLVED: To reduce a superimposition error of the both by a method wherein a transfer position of a second circuit pattern is corrected by data in a transfer position of a first circuit pattern, and the second circuit pattern is superimposed thereon to be transferred. SOLUTION: A first circuit pattern is transferred (1), a stage drive result at this time of transfer is monitored, and as a result of stage drive in a memory device, data of error of a transfer pattern position are acquired (2) and stored in the memory device (3). After a specific circuit pattern is processed (4), a second circuit pattern is superimposed on the first circuit pattern to be transferred. At this time, data stored are read out (5), a stage drive position is corrected based on these data, while a mask pattern is transferred (6). Thus, a specific circuit pattern can be processed with desired precision and an element can be made at high manufacturing yield. |
