ROTARY TYPE SUBSTRATE CLEANING DEVICE

摘要

PROBLEM TO BE SOLVED: To provide a rotary type substrate cleaning device which is capable of cleaning well even the place corresponding to the rotation center of a substrate without bringing its cleaning piece into contact with the surface of the substrate. SOLUTION: Cleaning liquid is applied onto the surface of a substrate which revolves around a vertical axis, and a cleaning piece 10 revolving around a horizontal axis P4 which makes a right angle with the rotating axis of the substrate is made to clean the surface of the substrate moving from its center of rotation of periphery. The cleaning piece 10 is moved in a vertical direction, controlled so as not to descend beyond a specific lowest position, and pressed against the surface of the substrate through the intermediary of a cleaning liquid film as kept separate from the surface of the substrate while it is in operation. The rotating axis P4 of the cleaning piece 10 is made to intersect the rotating axis of the substrate to make the rotating state of the cleaning piece 10 act on even the place corresponding to the center of rotation of the substrate.