发明名称 |
GaAs SUBSTRATE WITH COMPOSITIONALLY GRADED AlGaAsSb BUFFER FOR FABRICATION OF HIGH-INDIUM FETS |
摘要 |
Semiconductor devices made in high-indium-content semiconductor material (16) have advantageous properties, but similar substrate materials are hard to handle. A buffer layer (18) makes a lattice-constant transition between a GaAs substrate and a high-indium epitaxially deposited semiconductor such as those lattice-matched to InP. The buffer layer (18) is an epitaxial layer including atoms of two Group III elements, and atoms of two Group V elements, with the ratio of the atoms of at least one group varied along the depth of the buffer layer, in a manner which makes a transition of the lattice constant between that of the substrate and the high-indium semiconductor material. The Group III elements are gallium and aluminum, and the Group V elements are arsenic and antimony.
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申请公布号 |
WO9717723(A1) |
申请公布日期 |
1997.05.15 |
申请号 |
WO1996US17956 |
申请日期 |
1996.11.08 |
申请人 |
LOCKHEED MARTIN CORPORATION |
发明人 |
GILL, DAVID, M.;UPPAL, PARVEZ, NASIR |
分类号 |
H01L21/20;H01L29/10;(IPC1-7):H01L21/203;H01L29/205;H01L31/030 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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