发明名称 INTERFEROMETRIC MODULATION
摘要 <p>an interferometric modulator cavity (200, 202) has a reflector (208) and an induced absorber (206). A direct view reflective flat panel display may include an array of the modulators. Adjacent spacers of different thicknesses are fabricated on a substrate (204) by a lift-off technique used to pattern the spacers which are deposited separately, each deposition providing a different thickness of spacer. Alternately, a patterned photoresist may be used to allow for an etching process to selectively etch back the thickness of a spacer which was deposited in a single deposition. A full-color static graphical image may be formed of combined patterns of interferometric modulator cavities (200, 202). Each cavity includes a reflector (208), and an induced absorber (206), the induced absorber (206) including a spacer having a thickness that defines a color associated with the cavity.</p>
申请公布号 WO1997017628(A1) 申请公布日期 1997.05.15
申请号 US1996017731 申请日期 1996.11.06
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