发明名称 |
SUSPENDED MICROSTRUCTURES |
摘要 |
<p>A suspended microstructure process assembly includes a first microstructure assembly, with a temporary substrate having a first surface and a first microstr ucture fabricated on the first surface; a second microstructure assembly, including a f inal substrate having a second surface and a second microstructure fabricated on the second sur face; connecting elements for joining the first microstructure assembly to the second microstructure assembly with a predetermined separation and alignment; and a rem ovable bond temporarily securing the first microstructure assembly to the second micros tructure assembly until the temporary substrate is removed. The connecting elements may b e electrically conductive contacts or electrically nonconductive spacers. Electric ally conductive contacts may be supplied to the first microstructure from a back side of the first microstructure assembly. The first microstructure fabricated on the first surfac e may incorporate a removable layer to enable multiple level suspended structures.</p> |
申请公布号 |
CA2190077(A1) |
申请公布日期 |
1997.05.14 |
申请号 |
CA19962190077 |
申请日期 |
1996.11.12 |
申请人 |
ROCKWELL INTERNATIONAL CORPORATION |
发明人 |
TENNANT, WILLIAM E.;GERGIS, ISORIS S.;SEABURY, CHARLES W. |
分类号 |
G01J1/02;G01J5/02;G01J5/20;G03F7/00;H01L21/302;H01L37/02;(IPC1-7):H01L21/64;H01L21/306;H01L49/00;G01J5/00 |
主分类号 |
G01J1/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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