发明名称 SUSPENDED MICROSTRUCTURES
摘要 <p>A suspended microstructure process assembly includes a first microstructure assembly, with a temporary substrate having a first surface and a first microstr ucture fabricated on the first surface; a second microstructure assembly, including a f inal substrate having a second surface and a second microstructure fabricated on the second sur face; connecting elements for joining the first microstructure assembly to the second microstructure assembly with a predetermined separation and alignment; and a rem ovable bond temporarily securing the first microstructure assembly to the second micros tructure assembly until the temporary substrate is removed. The connecting elements may b e electrically conductive contacts or electrically nonconductive spacers. Electric ally conductive contacts may be supplied to the first microstructure from a back side of the first microstructure assembly. The first microstructure fabricated on the first surfac e may incorporate a removable layer to enable multiple level suspended structures.</p>
申请公布号 CA2190077(A1) 申请公布日期 1997.05.14
申请号 CA19962190077 申请日期 1996.11.12
申请人 ROCKWELL INTERNATIONAL CORPORATION 发明人 TENNANT, WILLIAM E.;GERGIS, ISORIS S.;SEABURY, CHARLES W.
分类号 G01J1/02;G01J5/02;G01J5/20;G03F7/00;H01L21/302;H01L37/02;(IPC1-7):H01L21/64;H01L21/306;H01L49/00;G01J5/00 主分类号 G01J1/02
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