发明名称 |
Method for forming a patterned oxide superconductor thin film |
摘要 |
<p>A method for forming a patterned oxide superconductor thin film on a substrate comprises steps of forming a metal or semi-metal layer on a portion of the substrate, on which the oxide superconductor thin film will be formed, forming a layer of a material including silicon on a portion of the substrate, on which an insulating layer will be formed, removing the metal or semi-metal layer and depositing an oxide superconductor thin film over the substrate.</p> |
申请公布号 |
EP0612114(B1) |
申请公布日期 |
1997.05.14 |
申请号 |
EP19940400313 |
申请日期 |
1994.02.14 |
申请人 |
SUMITOMO ELECTRIC INDUSTRIES, LTD. |
发明人 |
TANAKA, SO;NAKAMURA, TAKAO;IIYAMA, MICHITOMO |
分类号 |
H01L39/24;(IPC1-7):H01L39/24 |
主分类号 |
H01L39/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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