发明名称 |
Method for forming a multi-layer planarization structure |
摘要 |
An improved CVD apparatus for depositing a uniform film is shown. The apparatus comprises a reaction chamber, a substrate holder and a plurality of light sources for photo CVD or a pair of electrodes for plasma CVD. The substrate holder is a cylindrical cart which is encircled by the light sources, and which is rotated around its axis by a driving device. With this configuration, the substrates mounted on the cart and the surroundings can be energized by light of plasma evenly throughout the surfaces to be coated.
|
申请公布号 |
US5629245(A) |
申请公布日期 |
1997.05.13 |
申请号 |
US19950376736 |
申请日期 |
1995.01.23 |
申请人 |
SEMICONDUCTOR ENERGY LABORATORY CO., LTD. |
发明人 |
INUSHIMA, TAKASHI;HAYASHI, SHIGENORI;TAKAYAMA, TORU;ODAKA, MASAKAZU;HIROSE, NAOKI |
分类号 |
C23C16/02;C23C16/40;C23C16/44;C23C16/48;C23C16/517;C23C16/56;H01L21/316;(IPC1-7):H01L21/20 |
主分类号 |
C23C16/02 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|