发明名称 |
Chemically amplified positive resist composition |
摘要 |
In a chemically amplified positive resist composition comprising an organic solvent, an alkali soluble resin, an acid generator, and an optional dissolution inhibitor, a salt of a pyridine which may have an alkyl, alkoxy, amino or dialkylamino group with an alkylsulfonic acid, arylsulfonic acid or halogen atom is blended. Because of high sensitivity to deep UV and resolution and elimination of the PED problem causing T-top pattern configuration and the skirting phenomenon, the resist composition is improved in dimensional precision and lends itself to fine patterning.
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申请公布号 |
US5629134(A) |
申请公布日期 |
1997.05.13 |
申请号 |
US19950539759 |
申请日期 |
1995.10.06 |
申请人 |
SHIN-ETSU CHEMICAL CO., LTD.;NIPPON TELEGRAPH AND TELEPHONE CORP. |
发明人 |
OIKAWA, KATSUYUKI;ISHIHARA, TOSHINOBU;YAGIHASHI, FUJIO;TANAKA, AKINOBU;KAWAI, YOSHIO;NAKAMURA, JIRO |
分类号 |
G03F7/004;G03F7/039;(IPC1-7):G03C1/492;G03C1/494;G03C1/76 |
主分类号 |
G03F7/004 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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