| 摘要 |
The present invention provides a method of ameliorating the effects of misalignment between modulator arrays, and a system using the same. The ability reduce the effects of misalignment allows multiple, smaller, more cost effective arrays to be used instead of one large array. This can reduce the manufacturing costs of the array, especially arrays that are produced using semiconductor manufacturing processes such as the digital micromirror device. To avoid visual artifacts caused by the misalignment of two or more modulator arrays 1702, 1704, the individual arrays 1702, 1704 are optically overlapped and a portion of the image 1706 is generated by both arrays 1702, 1704. A breakpoint is chosen between two pixels in the overlapped region 1706 at which to abut the images from each of the modulator arrays 1702, 1704. The breakpoint is changed each row of pixels to minimize the detectability of any visual artifact caused by misalignment between the modulator arrays 1702, 1704.
|
