| 摘要 |
FIELD: microelectronics; manufacture of thin crystal members for high-frequency piezoelectric devices, such as crystal cavities and monolithic filters. SUBSTANCE: manufacturing process involves mechanical treatment of quartz blanks and their chemical and dynamic etching in acid solution with surface-active dopes of dimethyl formamide or butyl alcohol at 348-373 K in two stages. During first stage, etching is made in acid solution doped with butyl alcohol and blank obtained in the process has surface roughness equal to or higher than 0.04 mcm. Second stage involves chemical and dynamic etching with addition of dimethyl formamide; surface roughness of crystal member obtained is maximum 0.02 mcm. In either case, surface roughness is measured by etching traces along line inclined through 30 deg. to crystallographic axis X in quartz. Dynamic resistance of cavities produced in this way is in average 30% lower; yield of cavities having quality factor of 15•10and higher amounts to 5%. EFFECT: improved output capacity and yield of crystal members with high quality of surface. |
