| 摘要 |
A system (30, 120, 140, 200, 250, 300, 350, 400, 450) and method (550, 600, 700) for generating, filtering, and neutralizing surface treating plasma (38) within a process chamber (36) to allow a uniform plasma to surface treat a substrate (40). A plurality of coil elements (46) are operably coupled to form a plurality of effective coils (47), the effective coils (47) adjacently spaced apart to form a coil layer (32). A drive element (34) may be coupled to coil elements (46) to induce effective closed loop currents (48) in the effective coils (47) to induce magnetic fields (50, 52) at each effective coil (47). The coil elements (46) may also simply be terminated such that the application of plasma (38) induces the magnetic fields (50, 52) at the effective coil. The magnetic fields (50, 52) may be induced to generate a plasma (38), to confine plasma away from hardware, to filter a plasma, and to neutralize plasma.
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