Apparatus for coating a substrate by means of a chemical vapour deposition process

摘要

The apparatus comprises an alternating current source (3) connected to two cathodes (4, 5) which surround magnets and electrically interact with targets (6, 7). Each cathode is located in its own compartment (12, 13) bracketing a third compartment (14) connected to a vacuum source (21). The separating walls (17, 18) are provided with openings or gaps (15, 16) into the central compartment housing a substrate (2) oriented towards a chemical vapour deposition source. Such a source in essence consists of a reactive gas inlet (19) and a collimator (20).