| 摘要 |
The apparatus for coating substrates (2, 3) by cathode sputtering incorporates hollow cathodes (4, 5) with hollow targets (6, 7), and at least two lifting arms (8, 9) with grippers (10, 11) for holding the substrates. The lifting arms are installed in a motor-driven disk or beam (12) which is rotatable about its axis (13) oriented parallel to the cathode axes. By motorised means, the lifting arms are vertically adjustable relative to the rotation plane of the disk or beam.
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| 申请人 |
BALZERS UND LEYBOLD DEUTSCHLAND HOLDING AG, 63450 HANAU, DE |
发明人 |
BRAEUER, GUENTER, DR., 63579 FREIGERICHT, DE;KUKLA, REINER, 63457 HANAU, DE;FABER, RALF, 67251 FREINSHEIM, DE |
