| 发明名称 |
Resist material |
| 摘要 |
A photoresist composition comprising (a) a difficultly alkali-soluble special resin, (b) a photo-sensitive compound capable of generating a carboxylic acid, and (c) a solvent, is effective for pattern formation using deep ultraviolet light, KrF excimer laser beams, etc.
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| 申请公布号 |
US5627006(A) |
申请公布日期 |
1997.05.06 |
| 申请号 |
US19950425220 |
申请日期 |
1995.04.18 |
| 申请人 |
WAKO PURE CHEMICAL INDUSTRIES, LTD.;MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
URANO, FUMIYOSHI;OONO, KEIJI;FUJIE, HIROTOSHI |
| 分类号 |
G03F7/004;G03F7/023;G03F7/039;G03F7/075;(IPC1-7):G03F7/023 |
主分类号 |
G03F7/004 |
| 代理机构 |
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