| 摘要 |
PROBLEM TO BE SOLVED: To prevent a part of an exposure light from being reflected on the interface between an upper photoresist layer and a lower photoresist layer (anti-reflective layer) in forming a resist pattern using a multilayer resist method. SOLUTION: Between a lower photoresist layer (anti-reflective layer) 4 containing a light absorbing agent and an upper photoresist layer 6 containing no light absorbing agent, a photoresist layer 5 containing a light absorbing agent at a density substantially intermediate between the densities in the layers 4 and 6 is provided so that a moderate gradient of density of the light absorbing agent in the entire photoresists (4, 5 and 6) is realized. Thus, an exposure light is prevented from being easily reflected on the interface between the photoresist layers. |
