| 摘要 |
The target incorporates a frame (3, 4, ..., 7) which at least partially surrounds the material to be sputtered, and serves for holding the plate-shaped target on the cathode back plate (9). It also includes a separating foil or layer (20) of flexible material, and protrusions (3a, 3b, 4a, 4b, 7a, 7b, ) of various form which are rigidly attached to the frame, and serve for holding the target material in the spaces (A, B, C) surrounded by frame elements. Also claimed as method for producing such a target. |
