Plasma reactor with magnet for protecting an electrostatic chuck from the plasma and a method for using same,申请号EP19940117213-传众专利搜索

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发明名称	Plasma reactor with magnet for protecting an electrostatic chuck from the plasma and a method for using same
摘要
申请公布号	EP0651425(B1)	申请公布日期	1997.05.02
申请号	EP19940117213	申请日期	1994.10.31
申请人	APPLIED MATERIALS, INC.	发明人	CHAPMAN, ROBERT A.
分类号	H01L21/302;H01J37/32;H01L21/3065;H01L21/683;(IPC1-7):H01J37/32;H01L21/00	主分类号	H01L21/302
代理机构		代理人
主权项
地址

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