Photosensitive resin composition and method for forming pattern using the same

摘要

Disclosed is a photosensitive resin composition, comprising: (a) a polysilane having a weight-average molecular weight of not less than 10000, which is soluble in an organic solvent; (b) a combination of a photoradical generator and an oxidizing agent; (c) a silicone oil; and (d) an organic solvent, and a method for forming a pattern using the same. Since photoreactivity was extremely improved in comparison with a conventional polysilane composition, an exposure time was shorten. Therefore, it is possible to increase a productivity of a color filter.