| 摘要 |
PROBLEM TO BE SOLVED: To lower the temperature of a photosensitive material after heating without arranging any cooling zone between a heating unit and a wet type processing unit by providing a processing liquid supply mechanism cooling the photosensitive material in the wet type processing unit. SOLUTION: In a wet type processing unit 5, a conveyed photosensitive lithography print board 2 is immersed in a processing liquid 4 stored in a processing tank 10, the predetermined quantity of the processing liquid 4 is brought into contact with a photosensitive layer in the photosensitive lithography print board 2, and the processing of the photosensitive layer is achieved. The wet type processing unit 5 is provided with a processing liquid supply mechanism 13, which feeds the processing liquid 4 cooled by means of a cooler 8 onto a supporting base side face in the photosensitive lithography print board 2 so as to cool the photosensitive layer to a proper temperature adequate for processing before an application process of the proper temperature processing liquid 4 to the photosensitive layer in the photosensitive lithography print board 2, which is conveyed to the wet type processing, unit 5 from the heating unit 3, is started, that is, before the photosensitive lithography print board 2 is immersed in the processing liquid 4. |
