GAS INJECTION SYSTEM FOR SEMICONDUCTOR PROCESSING

摘要

A system (10) for injecting a gaseous substance into a semiconductor processing chamber (12). The injection system (10) includes at least one plenum (42) formed in a plenum body (52) and a plurality of nozzles (34) associated with each plenum (42) for injecting gaseous substances from the plenums (42) into the chamber (12). A conduit structure (48) transports gaseous substances along an indirect path from the plenum (42) to the nozzles (34). The nozzles (34) are positioned and configured to provide a uniform distribution of gaseous substances across the wafer (22) surface.