发明名称 Verfahren zur Mikrostrukturierung von Polymeren
摘要 <p>Production of microstructures in polymeric substrates containing at least 5 wt% of an aromatic or partly aromatic polycondensate (A), comprises irradiation with light with a wavelength of 260-360 nm so as to cause degradation of the substrate in the irradiated areas. The polycondensate (A), or the mixture of (A) and other thermoplastics, contains 5-100 mole% of units of formula (I), in which R1-R8 = hydrogen, halogen, optionally branched 1-18C alkyl or alkoxy, or optionally substituted 5-12C cycloalkyl or 6-20C alkaryl or aralkyl, preferably H or Me.</p>
申请公布号 DE19540074(A1) 申请公布日期 1997.04.30
申请号 DE1995140074 申请日期 1995.10.27
申请人 BAYER AG, 51373 LEVERKUSEN, DE 发明人 STEBANI, JUERGEN, DIPL.-CHEM., 47800 KREFELD, DE;WOKAUN, ALEXANDER, PROF.DR.DIPL.-CHEM., ENDINGEN, CH;LIPPERT, THOMAS, DR.DIPL.-CHEM., LOS ALAMOS, N. MEX., US;KUNZ, THILO, DIPL.-PHYS., ZURZACH, CH
分类号 C08J3/28;B23K26/402;B29C67/00;G03F7/00;G03F7/039;G11B7/245;G11B7/2533;G11B7/2534;G11B7/2535;(IPC1-7):C08J7/18;G11B7/24;C08L75/04;C08L69/00;B29C59/16;C08L67/03 主分类号 C08J3/28
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