摘要 |
<p>Production of microstructures in polymeric substrates containing at least 5 wt% of an aromatic or partly aromatic polycondensate (A), comprises irradiation with light with a wavelength of 260-360 nm so as to cause degradation of the substrate in the irradiated areas. The polycondensate (A), or the mixture of (A) and other thermoplastics, contains 5-100 mole% of units of formula (I), in which R1-R8 = hydrogen, halogen, optionally branched 1-18C alkyl or alkoxy, or optionally substituted 5-12C cycloalkyl or 6-20C alkaryl or aralkyl, preferably H or Me.</p> |
申请人 |
BAYER AG, 51373 LEVERKUSEN, DE |
发明人 |
STEBANI, JUERGEN, DIPL.-CHEM., 47800 KREFELD, DE;WOKAUN, ALEXANDER, PROF.DR.DIPL.-CHEM., ENDINGEN, CH;LIPPERT, THOMAS, DR.DIPL.-CHEM., LOS ALAMOS, N. MEX., US;KUNZ, THILO, DIPL.-PHYS., ZURZACH, CH |