摘要 |
<p>Phenylthio acetic acid derivatives of formula (I) in which the components and index have the following meanings: R1 is hydrogen and alkyl; R2 is cyano, nitro, trifluoro methyl, halogen, alkyl and alkoxy; m is 0, 1 or 2, in which the radicals R2 may be different if m is 2; R3 is hydrogen, cyano, nitro, hydroxy, amino, halogen, alkyl, halogen alkyl, alkoxy, halogen alkoxy, alkylthio, alkylamino or dialkylamino; R4 is hydrogen, cyano, nitro, hydroxy, amino, halogen, possibly substituted alkyl, alkoxy, alkylthio, alkylamino, dialkylamino, alkenyl, alkenyloxy, alkenylthio, alkenylamino, N-alkenyl-N-alkylamino, alkinyl, alkinyloxy, alkinylthio, alkinylamino, N-alkinyl-N-alkylamino, possibly substituted cycloalkyl, cycloalkyloxy, cycloalkylthio, cycloalkylamino, N-cycloalkyl-N-alkylamino, cycloalkenyl, cycloalkenyloxy, cycloalkenylthio, cycloalkenylamino, N-cycloalkenyl-N-alkylamino, heterocyclyl, heterocyclyloxy, heterocyclylthio, heterocyclylamino, N-heterocyclyl-N-alkylamino, aryl, aryloxy, arylthio, arylamino, N-aryl-N-alkylamino, hetaryl, hetaryloxy, hetarylthio, hetarylamino, N-hetaryl-N-alkylamino; R5 is hydrogen, possibly substituted alkyl, cycloalkyl, alkenyl, alkinyl, alkyl carbonyl, alkenyl carbonyl, alkinyl carbonyl or alkyl sulphonyl, possibly substituted aryl, aryl carbonyl, aryl sulphonyl, hetaryl, hetaryl carbonyl or hetaryl sulphonyl. The invention also concern their salts, the process and intermediate products for their production and their use.</p> |