发明名称 PLATING METHOD OF ALUMINIUM PATTERN IN LIQUID CRYSTAL COATED PHOTO-RESIST
摘要 an aluminum formation step of forming an aluminum pattern on a glass substrate; a photoresist deposition step of depositing a photoresist on top surface of the glass substrate where the aluminum pattern is formed; an aluminum pattern revealing step of revealing the aluminum pattern by etching the photoresist selectively; a zincate processing step of processing zincate on the revealed aluminum pattern; and a plating step of performing the electrolysis-free plating on the aluminum pattern.
申请公布号 KR970006936(B1) 申请公布日期 1997.04.30
申请号 KR19940015665 申请日期 1994.06.30
申请人 KIM, JUNG-DUK 发明人 KIM, CHOL-SOO;HONG, SUNG-JE;PARK, SOO-HOON;HAN, JUNG-INN;KANG, TAK
分类号 H01L21/3205;(IPC1-7):H01L21/320 主分类号 H01L21/3205
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