发明名称 |
PLATING METHOD OF ALUMINIUM PATTERN IN LIQUID CRYSTAL COATED PHOTO-RESIST |
摘要 |
an aluminum formation step of forming an aluminum pattern on a glass substrate; a photoresist deposition step of depositing a photoresist on top surface of the glass substrate where the aluminum pattern is formed; an aluminum pattern revealing step of revealing the aluminum pattern by etching the photoresist selectively; a zincate processing step of processing zincate on the revealed aluminum pattern; and a plating step of performing the electrolysis-free plating on the aluminum pattern.
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申请公布号 |
KR970006936(B1) |
申请公布日期 |
1997.04.30 |
申请号 |
KR19940015665 |
申请日期 |
1994.06.30 |
申请人 |
KIM, JUNG-DUK |
发明人 |
KIM, CHOL-SOO;HONG, SUNG-JE;PARK, SOO-HOON;HAN, JUNG-INN;KANG, TAK |
分类号 |
H01L21/3205;(IPC1-7):H01L21/320 |
主分类号 |
H01L21/3205 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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