发明名称 |
Reduction of skin irritation and resistance during electrotransport |
摘要 |
An electrotransport delivery device utilizing reservoir buffering at a select pH ranges in order to reduce skin irritation and skin resistance is provided. Cathodic reservoirs are buffered to a pH of less than about 4, preferably to a pH in the range of about 2 to 4, while anodic reservoirs are buffered to a pH above about 4, preferably to a pH in the range of about 4 to 10. Another electrotransport delivery device utilizes a potassium sensor to monitor potassium efflux from the skin. Potassium efflux above a certain predetermined level has been found to be a precursor to skin irritation/erythema. Operation of the device is modified (eg, terminated) when the predetermined potassium efflux level is sensed.
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申请公布号 |
US5624415(A) |
申请公布日期 |
1997.04.29 |
申请号 |
US19950427336 |
申请日期 |
1995.04.24 |
申请人 |
ALZA CORPORATION |
发明人 |
CORMIER, MICHEL J. N.;LEDGER, PHILIP W.;JOHNSON, JUANITA;PHIPPS, JOSEPH B.;CHAO, STELLA |
分类号 |
A61N1/30;(IPC1-7):A61N1/30 |
主分类号 |
A61N1/30 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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