发明名称 |
Showerhead for a gas supplying apparatus |
摘要 |
A gas supply apparatus, for use in a semiconductor device manufacturing process, provides a showerhead for evenly supplying various kinds of gases to a reaction chamber. The gas supplying apparatus for use in the formation of a thin film of a semiconductor device includes a first porous plate having a plurality of first holes formed throughout its surface, and a central bore formed at its center; and a second porous plate having first projections which are regularly formed throughout its central portion, and second projections which contain depressions continuously formed around the first projections. The gas supplying apparatus evenly distributes gas into the reaction chamber, thereby improving the uniformity of the film thickness to be grown on a substrate.
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申请公布号 |
US5624498(A) |
申请公布日期 |
1997.04.29 |
申请号 |
US19940352249 |
申请日期 |
1994.12.08 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
LEE, GIL-GWANG;FUJIHARA, KAZUYUKI;CHANG, KYU-HWAN |
分类号 |
F17D1/04;C23C16/44;C23C16/455;H01L21/205;(IPC1-7):C23C16/00 |
主分类号 |
F17D1/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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