发明名称 ORGANIC MATERIAL APPLYING APPARATUS
摘要 <p>An organic material applying apparatus of the present invention includes a movable organic material discharge nozzle having an organic material discharge port for discharging an organic material at a position facing a semiconductor wafer. The opening width of the discharge port is adjustable. A movement time of the nozzle measured from a predetermined position of the semiconductor wafer at a predetermined velocity of relative movements of the nozzle and semiconductor wafer is detected by a movement time detecting device. A width of that portion of the semiconductor wafer, which the discharge port of the moved nozzle faces, is calculated by a wafer width calculating device on the basis of the movement time of the nozzle detected by the movement time detecting device. The opening width of the discharge port of the nozzle is adjusted by a nozzle discharge port opening width adjusting device in accordance with the wafer width calculated by the wafer width calculating device. Thereby, the amount of wasted organic material discharged from the nozzle is reduced.</p>
申请公布号 KR970006215(B1) 申请公布日期 1997.04.24
申请号 KR19940001420 申请日期 1994.01.27
申请人 TOSHIBA KK. 发明人 NOMURA, WATARU;HARAGUCHI, HIROSI;ABE, MASAHIRO
分类号 B05C11/10;H01L21/00;(IPC1-7):H01L21/312 主分类号 B05C11/10
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