X-ray optical element

摘要

In one aspect, the invention involves an optical element in an x-ray imaging system. The element comprises a substrate (10) overlain by a multilayer coating (60). The multilayer coating comprises plural first and at least second material layers in alternation. This coating is soluble in at least one etchant solution at an etching temperature less than 100 DEG C. The optical element further comprises a barrier layer (50) intermediate the substrate and the multilayer coating. The barrier layer is relatively insoluble in the etchant solution at the etching temperature. In a second aspect of the invention, the optical element comprises a substrate and a multilayer coating as described above, and further comprises a release layer that underlies the multilayer coating. The release layer comprises a material that is relatively soluble in at least one etchant solution at an etching temperature less than 100 DEG C. In contrast to release layers of the prior art, the inventive release layer comprises germanium.