发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 PROBLEM TO BE SOLVED: To provide photosensitive resin composition with excellent water-based development stabilized even after conserved for a long time. SOLUTION: Photosensitive resin composition contains (A) particulate hydrophilic or water-swollen elastomer, (B) ethylene unsaturated compound, (C) photopolymerization initiator and (D) phosphoric ester compound shown in the formula I and/or the formula II. In the formula I and the formula II, Y<1> , Y<3> , Y<5> are hydrogen atoms, alkali metals or alkali earth metals, Y<2> is R<4> O-(CH2 CH2 O)n-, hydrogen atoms, alkali metals or alkali earth metals, Y<4> is alkali metals or alkali earth metals. R<1> -R<4> are alkyl groups, aryl groups, alkyl allylene groups, aryl alkylene groups or aryl alkylene groups with the number of carbons being 8-30 and (n) is 1-50 integers.
申请公布号 JPH09106068(A) 申请公布日期 1997.04.22
申请号 JP19950265721 申请日期 1995.10.13
申请人 TOYOBO CO LTD 发明人 NAGAHARA SHIGENORI;OGI KOJI;IMAHASHI SATOSHI
分类号 G03F7/004;G03F7/00;G03F7/027;G03F7/028;G03F7/033;(IPC1-7):G03F7/004 主分类号 G03F7/004
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