| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to integrally treat hard coating and antireflection films and thin films having a water burn preventive property and antistatic property by a drying method by specifying a thin film forming method and reflection film forming method. SOLUTION: A hard coating layer of an org. or inorg. compd. is formed by using a gaseous mixture composed of an org. compd. contg. Si and gaseous oxygen by the thin film forming method using plasma CVD. The antireflection film is formed on the hard coating layer by using a vacuum vapor deposition method. Further, gases consisting of the gaseous org. compd. contg. Si and nitro compd. are introduced onto the antireflection film by a chemical vapor growth method using plasma to effect reaction, by which the multifunctional thin film consisting of the amide group-contg. silane compd. is formed. As a result, the hard coating and antireflection films and further, the thin films having the water burn preventive property and antistatic property in combination are formed only by the dry process without using a wet process. |
