| 摘要 |
PROBLEM TO BE SOLVED: To simplify the constitution of a projection aligner while the alignment accuracy of the device is maintained and to contribute to the reduction in the cost of the device. SOLUTION: The image of a slit pattern 70 on a mask 32 is made to scan relatively to a mark on a substrate and scattered light, which is generated by this scanning, is detected. On the basis of the intensity distribution of the detected scattered light, the relative position of the mask 32 to the substrate 40 is detected. |
