| 摘要 |
PROBLEM TO BE SOLVED: To form more precise device patterns even for island-shaped patterns by arranging phase shifters in optimum. SOLUTION: An exposure mask to form DRAM cells has island-shaped light transmissive parts of 1/4 pitch array type arranged and light shading parts surrounding them. Among the pattern of the light transmissive parts neighboring each other, one of a pair of light transmissive parts which have the pattern ends opposing each other at a minimum space in the extended direction is provided with a phase shift layer to shift the phase of transmitted light by 180 deg.C. |
