发明名称 AUTOMATIC PROCESSING DEVICE OF SEMICONDUCTOR EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To realize an automatic processing device which is capable of efficiently carrying out a stepper exposure process and lessened in floor space. SOLUTION: A cassette arrangement section 5 is arranged confronting the wafer loading/unloading opening 2a of a stepper exposure system 2, a processing section 6 is arranged between the cassette arrangement section 5 and the wafer loading/unloading opening 2a of the stepper exposure system 2 so as to make its lengthwise direction nearly vertical to the direction in which the cassette arrangement section 5 and the stepper exposure system 2 are arranged opposed to each other. An indexer robot 7 and a transfer robot 8 buffers 10 and 11 where wafers can he placed for each transfer direction are provided between an indexer robot 7 and a transfer robot 8 and between the indexer robot 7 and a turning robot 9.
申请公布号 JPH09107012(A) 申请公布日期 1997.04.22
申请号 JP19950261455 申请日期 1995.10.09
申请人 YUASA SEISAKUSHO:KK 发明人 YUASA KENJI
分类号 G03F7/20;H01L21/027;H01L21/677;(IPC1-7):H01L21/68 主分类号 G03F7/20
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