发明名称 MANUFACTURE OF ELECTRON EMISSION FILM, ELECTRON EMISSION ELEMENT, ELECTRON SOURCE, DISPLAY ELEMENT AND IMAGE FORMING DEVICE, AND ETCHANT FOR PLATINUM MATERIAL
摘要 <p>PROBLEM TO BE SOLVED: To suppress the reduction of an obtained thin film thickness and provide an electron emission element having little dispersion of element characteristics by keeping a manufacturing atmosphere in a reduced pressure state or a cooled state as a manufacturing of an electron emission film. SOLUTION: After washing an insulating substrate 5, element electrode material is deposited by a vacuum deposition method, or the like, and thereafter, element electrodes 9, 10 are formed on the surface of the substrate 5. A thin film for forming an electron emission portion 6 are formed between the electrodes 8, 9 provided on the substrate 5. As a forming method, an organic metal compound or an inorganic metal compound is used as raw material, and manufacturing is conducted by a bubble jet method. Either or both of a pressure reduction method or a cooling method of the atmosphere of the bubble jet method. Like this, the thin film is formed, and thereafter heat-treated. By the heat treatment, the thin film is changed into a metal particulate film or a metal oxide particulate film, and is subjected to patterning by lift-off, etching, or the like so as to form the thin film 6.</p>
申请公布号 JPH09106758(A) 申请公布日期 1997.04.22
申请号 JP19950288166 申请日期 1995.10.11
申请人 CANON INC 发明人 TAKAHASHI YASUO
分类号 C23F1/30;H01J9/02;(IPC1-7):H01J9/02 主分类号 C23F1/30
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