发明名称 Oberflächenbehandlungsaufbau für eine Lötverbindung und flußmittelfreies Lötverfahren unter Verwendung dieses Aufbaus
摘要 PCT No. PCT/JP93/01788 Sec. 371 Date Aug. 9, 1994 Sec. 102(e) Date Aug. 9, 1994 PCT Filed Dec. 9, 1993 PCT Pub. No. WO94/14190 PCT Pub. Date Jun. 23, 1994On a rear surface of a semiconductor (10), a contact layer (11), a diffusion preventing layer (12) and a solder joint layer (13) are formed, and this solder joint layer (13) is connected to a mount base (15) by a Pb-Sn solder layer (14). The contact layer (11) is formed of a rare earth metal, its silicide or a composite thereof, the diffusion preventing layer (12) is formed of a ferrous metal, and the solder joint layer (13) is formed of a Ni-Au alloy. By forming the diffusion preventing layer (12) using the ferrous metal, a diffusion of tin in a solder is prevented and by the solder joint layer (13) of the Ni-Au alloy, an excellent solder joint property can be maintained to reduce the number of laminated layers. Further, as a surface treated layer of at least one joint member, the Ni-Au alloy is used and by heating the semiconductor substrate via a solder foil in a reducing atmosphere a high airtightness is obtained.
申请公布号 DE4396525(T1) 申请公布日期 1997.04.17
申请号 DE19934396525T 申请日期 1993.12.09
申请人 NIPPONDENSO CO., LTD., KARIYA, AICHI, JP 发明人 FUJIKAWA, HISAYOSHI, SETO, AICHI, JP;OHWAKI, TAKESHI, NAGOYA, AICHI, JP;TAGA, YASUNORI, NAGOYA, AICHI, JP;TAKENAKA, OSAMU, KARIYA, AICHI, JP;KONDO, KENJI, AICHI, JP;YONEYAMA, TAKAO, GIFU, JP;KONDO, ICHIHARU, NAGOYA, AICHI, JP
分类号 H01L21/60;H01L23/482;H01L23/492;H01L23/495 主分类号 H01L21/60
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