发明名称 Erhöhung eines Stabilitätsverhaltens von Vorrichtungen auf der Grundlage von amorphem Silizium, die durch Plasmaablagerung unter hochgradiger Wasserstoffverdünnung bei niedrigerer Temperatur hergestellt werden
摘要 <p>High quality, stable photovoltaic and electronic amorphous silicon devices which effectively resist light-induced degradation and current-induced degradation, are produced by a special plasma deposition process. Powerful, efficient single and multi-junction solar cells with high open circuit voltages and fill factors and with wider bandgaps, can be economically fabricated by the special plasma deposition process. The preferred process includes relatively low temperature, high pressure, glow discharge of silane in the presence of a high concentration of hydrogen gas.</p>
申请公布号 DE19581590(T1) 申请公布日期 1997.04.17
申请号 DE1995181590T 申请日期 1995.03.09
申请人 AMOCO/ENRON SOLAR, FREDERICK, MD., US 发明人 LI, YAUN-MIN, LANGHORNE, PA., US;BENNETT, MURRAY S., LANGHORNE, PA., US;YANG, LIYOU, PLAINSBORO, N.J., US
分类号 C23C16/42;C23C16/50;H01L21/205;H01L31/0376;H01L31/04;H01L31/075;H01L31/076;H01L31/20;(IPC1-7):H01L31/06;H01L31/037 主分类号 C23C16/42
代理机构 代理人
主权项
地址