| 摘要 |
PURPOSE:To easily form an intercalation compound thin film in high precision by evaporating two or more kinds of raw materials, ionizing the vapory and depositing on a substrate while controlling the quantity of flux. CONSTITUTION:Cells, heaters, etc., are provided to evaporate plural raw materials against a substrate for forming an intercalation compound thin film and ionizing sources such as coils of the number same as the number of the evaporation sources are placed between the evaporation sources and the substrate. The plural raw materials are evaporated with heat, etc., and ionized in such a manner as to carry the materials with charges of different signs. The ions having different signs are reacted with each other near the substrate to deposit a reaction product on the substrate. The evaporation apparatus is schematically drawn in the figure. The raw materials are evaporated from the cells 1, 2 while controlling the quantity of fl-ux and monitoring the film thicknesses with filmthickness monitors 8, 9, the vapors are ionized with coils 3, 4 and the produced ions 6, 7 are reacted with each other to form a thin film 10 on the substrate 5. |
