Gas injection slit nozzle for a plasma process reactor

摘要

The disclosure relates to a gas injection apparatus for injecting gases into a plasma reactor vacuum chamber having a chamber housing, a pedestal holding a workpiece to be processed, a device for applying RF energy into the chamber, the gas injection apparatus having a gas supply containing an etchant species in a gas, an opening in the chamber housing, a gas distribution apparatus disposed within the opening in the chamber housing which has at least one slotted aperture (25) facing the interior of the chamber and a device for controlling the flow rate of gas from the one or more slotted apertures, and a gas feed line (15) from the supply to the gas distribution apparatus (20a). The apparatus includes a centre member surrounded by at least one annular member (10) with a gap therebetween comprising the slotted aperture. Each of the members of the gas distribution apparatus comprises a material at least nearly impervious to attack from the etchant species. In one example, each of the members of the gas distribution apparatus comprises one of a ceramic, fused quartz, polymeric or anodized aluminum material and the gas feed line comprises stainless steel. Preferably, each of the members has its surface polished prior to assembly of the gas distribution apparatus. <IMAGE> <IMAGE> <IMAGE> <IMAGE>