发明名称 Process and arrangement for producing dose profiles for the fabrication of structured surfaces
摘要 PCT No. PCT/EP94/03306 Sec. 371 Date May 26, 1995 Sec. 102(e) Date May 26, 1995 PCT Filed Oct. 6, 1994 PCT Pub. No. WO95/10799 PCT Pub. Date Apr. 20, 1995The object of a process and an arrangement for producing dose profiles for the fabrication of structured surfaces with a beam which is used for exposure and is directed on the surface consists in arranging the surface irradiation in such a way that the processing times and material outlay required for fabrication of micro-lenses and micro-lens arrays can be substantially reduced. According to the invention, the beam has at least one shaped region in cross section, which shaped region is movable relative to the surface and whose extent in the movement direction of the relative movement, in combination with the velocity of the relative movement, determines the dose. Effective lithographic fabrication of lens structures, in particular micro-lenses and micro-lens arrays, can be realized with the invention.
申请公布号 US5620814(A) 申请公布日期 1997.04.15
申请号 US19950446607 申请日期 1995.05.26
申请人 LEICA LITHOGRAPHIE SYSTEME JENA GMBH 发明人 KLEY, ERNST-BERNHARD
分类号 B29D11/00;G02B3/08;G03F7/00;G03F7/20;(IPC1-7):G03F9/00 主分类号 B29D11/00
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