| 摘要 |
<p>PROBLEM TO BE SOLVED: To make it possible to obtain a liquid crystal display device with which the occurrence after-images is suppressed and the display quality is good. SOLUTION: This process has a stage for forming a lower electrode material on a substrate, forming a photoresist on this lower electrode material and pattern forming the photoresist by photolithographic processing, a stage for etching the lower electrode material to form lower electrodes 13 by using the patterned photoresist as an etching mask, a stage for forming anodically oxidized films 15 on the surfaces of the lower electrodes by subjecting these electrodes to an anodic oxidation treatment, then subjecting these films to a heat treatment, a stage for forming an upper electrode material and subjecting the material to a heat treatment and forming the photoresist on an upper electrode material and pattern forming the photoresist by the photolithographic processing and a stage for etching the upper electrode material to form upper electrodes 17 by using the pattern formed photoresist as an etching mask.</p> |
