发明名称 Methods for fabricating monolithic device containing circuitry and suspended microstructure
摘要 A monolithic capacitance-type microstructure includes a semiconductor substrate, a plurality of posts extending from the surface of the substrate, a bridge suspended from the posts, and an electrically-conductive, substantially stationary element anchored to the substrate. The bridge includes an element that is laterally movable with respect to the surface of the substrate. The substantially stationary element is positioned relative to the laterally movable element such that the laterally movable element and the substantially stationary element form a capacitor. Circuitry may be disposed on the substrate and operationally coupled to the movable element and the substantially stationary element for processing a signal based on a relative positioning of the movable element and the substantially stationary element. A method for fabricating the microstructure and the circuitry is disclosed.
申请公布号 US5620931(A) 申请公布日期 1997.04.15
申请号 US19950468879 申请日期 1995.06.06
申请人 ANALOG DEVICES, INC. 发明人 TSANG, ROBERT W. K.;CORE, THERESA A.
分类号 B81B3/00;B81C99/00;G01P15/08;G01P15/125;G01P15/13;(IPC1-7):H01L21/00 主分类号 B81B3/00
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