发明名称 Stripe laser diode having an improved efficiency for current confinement
摘要 A method for fabricating a laser diode, comprises the steps of: forming a first stripe structure defined by a plurality of crystallographically distinct surfaces on a surface of a semiconductor substrate; forming an epitaxial layer of InGaAlP on the semiconductor substrate including the first stripe structure by a decomposition of gaseous source materials of In, Ga, Al and P; wherein the InGaAlP layer is doped to the p-type by incorporating Mg while growing the InGaAlP by adding a gaseous source material of Mg into said source materials of In, Ga, Al and P such that the InGaAlP layer is doped to the p-type with a substantially uniform carrier concentration level irrespective of the crystal surfaces forming the stripe structure.
申请公布号 US5621748(A) 申请公布日期 1997.04.15
申请号 US19950427352 申请日期 1995.04.24
申请人 FUJITSU LIMITED 发明人 KONDO, MAKOTO;FURUYA, AKIRA;ANAYAMA, CHIKASHI;SUGANO, MAMI;DOMEN, KAY;TANAHASHI, TOSHIYUKI;SEKIGUCHI, HIROSHI
分类号 G11B7/125;H01L33/00;H01L33/30;H01S5/223;H01S5/30;H01S5/32;H01S5/323;(IPC1-7):H01S3/19 主分类号 G11B7/125
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