发明名称 Spring-loaded mount for a rotatable sputtering cathode
摘要 A rotatable magnetron cathode has one end adapted to be attached to a drive shaft and a free end supported by a yoke suspended from spring-loaded supporting devices attached to a sputtering chamber wall. A dark space shield is attached to the cathode where the cathode connects to the drive shaft of its motor so as to rotate with the cathode. Another dark space shield is attached at the free end of the cathode with an insulator bearing in between such that the cathode can rotate without causing the shield at its front to also rotate. An insulator pad is placed between the yoke and a metal cover piece attached to the shield at the front so as to keep the frontal dark space shield in an electrically floating condition.
申请公布号 US5620577(A) 申请公布日期 1997.04.15
申请号 US19960590811 申请日期 1996.01.24
申请人 VIRATEC THIN FILMS, INC. 发明人 TAYLOR, CLIFFORD L.
分类号 C23C14/34;H01J37/34;(IPC1-7):C23C14/35 主分类号 C23C14/34
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