发明名称 High-strength copper based alloy free from smutting during pretreatment for plating
摘要 A high-strength Cu based alloy, consists essentially of: Ni: 0.5 to 2.0 %; Sn: 1.2 to 2.5 %; Si: 0.04 to 0.1 %; Zn: 0.1 to 1 %; Mg: 0.0001 to 0.02 %; Mn: 0.0001 to 0.1 %; P: 0.0001 to 0.02 %; and Cu and inevitable impurities: the balance, wherein the total content of Mg, Mn and P is 0.001 to 0.12 %. The Cu based alloy is suitable for use as a material of electrical and electronic parts, and free from smutting during pretreatment for plating thereof.
申请公布号 EP0767244(A1) 申请公布日期 1997.04.09
申请号 EP19960112587 申请日期 1996.08.03
申请人 MITSUBISHI SHINDOH CO., LTD. 发明人 FUTATSUKA, RENSEI;KUMAGAI, JUNICHI;CHIBA, SHUNICHI
分类号 C22C9/02;C22C9/06;H01L23/48 主分类号 C22C9/02
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