发明名称 |
High-strength copper based alloy free from smutting during pretreatment for plating |
摘要 |
A high-strength Cu based alloy, consists essentially of: Ni: 0.5 to 2.0 %; Sn: 1.2 to 2.5 %; Si: 0.04 to 0.1 %; Zn: 0.1 to 1 %; Mg: 0.0001 to 0.02 %; Mn: 0.0001 to 0.1 %; P: 0.0001 to 0.02 %; and Cu and inevitable impurities: the balance, wherein the total content of Mg, Mn and P is 0.001 to 0.12 %. The Cu based alloy is suitable for use as a material of electrical and electronic parts, and free from smutting during pretreatment for plating thereof. |
申请公布号 |
EP0767244(A1) |
申请公布日期 |
1997.04.09 |
申请号 |
EP19960112587 |
申请日期 |
1996.08.03 |
申请人 |
MITSUBISHI SHINDOH CO., LTD. |
发明人 |
FUTATSUKA, RENSEI;KUMAGAI, JUNICHI;CHIBA, SHUNICHI |
分类号 |
C22C9/02;C22C9/06;H01L23/48 |
主分类号 |
C22C9/02 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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