| 摘要 |
PROBLEM TO BE SOLVED: To improve the resolving power of a contact hole, the depth of a focus of the hole and deep UV curability without deteriorating the balance of various properties by incoporating an alkali-soluble resin and naphthoquinonediazidosulfonic ester of a polyhydroxy compd. having a specified nuclear structure. SOLUTION: This photoresist compsn. contains an alkali-soluble resin and at least one kind of 1,2-naphthoquinonediazido-5-(and/or-4-)sulfonic ester of a polyhydroxy compd. represented by formula I, II or III. In the formula I-III, each of R1 -R8 is H, hydroxyl, optionally substd. alkyl, etc., each of R9 -R17 is H, optionally substd. alkyl, alkoxy, etc., at least one of R1 -R17 is allyl, each of X1 -X4 is H, alkyl, etc., and each of (m) and (n) is an integer of 0-2. |
