发明名称 |
Magnetronverstuifbron en het gebruik ervan. |
摘要 |
The sputtering arrangement incorporates a rotationally symmetric magnetron sputter source (1) and a holding arrangement (10, 11) for a disk-shaped workpiece (9). The source (1) has at least two ring-shaped electron traps respectively with radii (R1, R2) in the sputtering source plane (6, 7) which is at a distance (d) from the workpiece. The ratio (R2-R1)/d lies between 0.8 and 3.0. |
申请公布号 |
NL1004217(A1) |
申请公布日期 |
1997.04.08 |
申请号 |
NL19961004217 |
申请日期 |
1996.10.07 |
申请人 |
BALZERS AKTIENGESELLSCHAFT |
发明人 |
PIUS GRUENENFELDER;HANS HIRSCHER;WALTER HAAG;WALTER ALBERTIN |
分类号 |
C23C14/14;C23C14/34;C23C14/35;H01J37/34 |
主分类号 |
C23C14/14 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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