CHARGED PARTICLE BEAM TRANSFER DEVICE, PATTERN DIVIDING METHOD, MASK, AND CHARGED PARTICLE BEAM TRANSFER METHOD

摘要

PROBLEM TO BE SOLVED: To provide a charged particle beam transfer device, a pattern dividing method, a mask, and a charged particle beam transfer method, wherein a transferred pattern can be lessened in joining error. SOLUTION: When split transfer patterns 3ba, 3bb,... transferred onto a wafer by a charged particle beam are determined, a transfer pattern 3 is split by zigzag splitting lines d2 corresponding to component patterns P11 , P12 ... comprised in it, and the split transfer patterns 3ba, 3bb,... are formed in regions 1aa, 1ab,... on a mask 1. The regions 1aa, 1ab,... of the mask 1 are successively irradiated with a charged particle beam, and the split transfer patterns 3ba, 3bb,... are successively transferred onto the wafer 1, whereby the transfer pattern 3 is formed on the wafer 1.