COATING FILM EXCELLENT IN CORROSION RESISTANCES TO HALOGEN GAS AND HALOGEN PLASMA, AND LAMINATED STRUCTURE FORMED WITH THE COATING FILM

摘要

PROBLEM TO BE SOLVED: To provide a coating film constitution showing excellent corrosion resistance by specifying the half-width in X-ray diffraction of a thin film layer. SOLUTION: For stably and effectively showing corrosion resistances to halogen gases and halogen plasma, as for the film quality of an Al oxide thin film, it is needed that the peak less than 5 in the half-width in X-ray diffraction is not shown, namely, it is substantially composed of amorphous one. The thickness of the coating film is preferably regulated to 0.1 to 20μm. The coating film is formed on a substrate by a sputtering method. The laminated structure is produced by forming the coating film on the substrate. Thus, the objective coating film constitution showing excellent corrosion resistances to halogen gases and halogen plasma and the objective laminated structure formed with the above film can be provided.