PHOTOPOLYMERIZABLE COMPOSITION AND PHOTOSENSITIVE LITHOGRAPHIC PLATE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To obtain a photopolymerizable composition having good sensitivity and developability. SOLUTION: In this photopolymerizable composition containing a compound having addition-polymerizable ethylenic unsaturations and a photopolymerization initiator, the compound having addition-polymerizable ethylenic unsaturations comprises a mixture containing a compound having two or more urethane bonds and six or more ethylenic unsaturations and a compound freed from any urethane bond and having three or more ethylenic unsaturations in a weight ratio of (4:1) to (1:4).