发明名称 BENZOTRIAZOLE COMPOUND AND HEAT-SENSITIVE RECORDING MATERIAL
摘要 PROBLEM TO BE SOLVED: To obtain a new compound useful as a protecting layer, etc., in a heat-sensitive recording material due to excellent fixity and light resistance, especially reduction in light transmissivity after fixation in a wave length region to cause light fixation. SOLUTION: This compound is shown by formula I or in formula II [(m) is 1 or 2; A is a group of formula III (R<1> and R<2> are each H, an alkyl, etc.; ring B is phenyl or naphthyl), etc., when m=1 formula I, and in formula II, etc., or a group of formula IV, etc., when m=2; X is H, an aryl, etc.; W is H, a halogen etc.; Y is H, an alkenyl, etc., in the formula I, OR<4> O (R<4> is an alkylene, an arylene, etc.), etc., in the formula II; Z is a halogen, an alkyl, etc.], etc. The compound, for example, is obtained by reacting a benzotriazole compound such as 4-t-butyl-6-sec-butyl-2-(2H-benzotriazol-2-yl)phenol, etc., with a cinnamic acid derivative obtained by reacting 2-acetyloxy-&alpha;-methylcinnamic acid with thionyl chloride, in the presence of a base.
申请公布号 JPH0995487(A) 申请公布日期 1997.04.08
申请号 JP19960123550 申请日期 1996.05.17
申请人 FUJI PHOTO FILM CO LTD 发明人 TAKASHIMA MASANOBU;MINAMI KAZUMORI;YUMOTO MASATOSHI;ADACHI KEIICHI
分类号 G03C1/815;B41M5/26;B41M5/28;B41M5/30;B41M5/323;B41M5/337;C07D249/20;C09K3/00;G03C1/52 主分类号 G03C1/815
代理机构 代理人
主权项
地址