| 摘要 |
PROBLEM TO BE SOLVED: To prevent exposure under a state where focus error occurs and uneven exposure due to positional shift in the scanning and non-scanning direction between an original plate and a substrate or the positional fluctuation between them. SOLUTION: The scanning aligner comprises an illumination means 1 having a laser light source, means 13, 14 for moving an original plate and a substrate such that a pattern on the original plate is exposed onto the substrate by an illumination light projected from the illumination means, means 101 for measuring the relative position between the original plate and substrate, and means 104 for controlling the operation of scanning aligner. The control means 104 starts to move the original plate and substrate for the purpose of scanning alignment and measures the relative position before starting the exposure. When a decision is made that the relative position thus measured comes within a predetermined range, the controller 104 controls the scanning aligner not to perform the exposure. |
